| 摘要 |
Provided is a substrate transport roller (2a) capable of ensuring a broad temperature-control region on a substrate, without reducing substrate transport quality. This substrate transport roller (2a) is provided in a film-forming device (1) for executing a film-forming process on the surface of a film substrate (W), transports the film substrate (W) by rotating around a center axis, and is equipped with: a center-section segment (13a) positioned in the center section in the axial direction extending along the center axis, and having a first outer-circumferential surface; end-section segments (12a, 12b) positioned on both sides on the outside in the axial direction of the center-section segment (13a), and each having a second outer-circumferential surface which contacts the substrate (W) and has a larger diameter than that of the first outer-circumferential surface; a center-section-rising-falling-temperature-medium mechanism for changing the temperature of the center-section segment (13a); and a both-end-section-rising-falling-temperature mechanism for changing the temperature of each of the end-section segments (12a, 12b) independently from the center-section segment (13a). |
