发明名称 |
SURFACE TREATMENT METHODS AND SYSTEMS FOR SUBSTRATE PROCESSING |
摘要 |
<p>Embodiments provided herein describe methods and systems for processing substrates. A plasma including radical species and charged species is generated. The charged species of the plasma are collected. A substrate is exposed to the radical species of the plasma. A layer is formed on the substrate after exposing the substrate to the radical species.</p> |
申请公布号 |
WO2014100721(A1) |
申请公布日期 |
2014.06.26 |
申请号 |
WO2013US77237 |
申请日期 |
2013.12.20 |
申请人 |
INTERMOLECULAR, INC. |
发明人 |
LANG, CHI-I;NIYOGI, SANDIP |
分类号 |
H01L21/31;H01L21/469 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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