| 摘要 |
<p>PROBLEM TO BE SOLVED: To control more precisely a stepped shape of a resist pattern to be formed on a transfer object material.SOLUTION: A multilevel gradation photomask is provided, which has a transfer pattern comprising a light-shielding part, a light-transmitting part, a first translucent part and a second translucent part formed on a transparent substrate. The transmittance of the first translucent part to exposure light is smaller than the transmittance of the second translucent part to exposure light; and a phase difference between the exposure light transmitted through the first translucent part and the exposure light transmitted through the second translucent part is controlled in such a manner that the intensity of light formed by interference between the exposure light transmitted through the first translucent part and the exposure light transmitted thorough the second translucent part is equal to or higher than the intensity of the exposure light transmitted through the first translucent part.</p> |
