| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for forming a reticle pattern unlikely to entail reticle inspection errors.SOLUTION: The provided method comprises: a first step of optical-proximity-correction-processing (OPC-processing) a first pattern and a second pattern; a second step of inspecting whether or not the gap between the first vertex of a first interior angle of less than 180° included within the OPC-processed first pattern and the second vertex of a second interior angle of less than 180° included within the OPC-processed second pattern is narrower than a reference value, and a third step of deleting, from the first pattern, a first vertex portion including first vertex and deleting, from the second pattern, a second vertex portion including second vertex in a case where the gap is narrower than the reference value.</p> |
