| 发明名称 |
APPARATUS AND METHOD FOR MANUFACTURING THIN FILM ENCAPSULATION |
| 摘要 |
An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process. |
| 申请公布号 |
US2014179041(A1) |
申请公布日期 |
2014.06.26 |
| 申请号 |
US201313973954 |
申请日期 |
2013.08.22 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
Huh Myung-Soo;Yi Jeong-Ho;Lee Yong-Suk |
| 分类号 |
H01L33/52 |
主分类号 |
H01L33/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A thin film encapsulation manufacturing apparatus comprising:
a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process. |
| 地址 |
Yongin-City KR |
