FILM FORMATION METHOD AND FILM FORMATION DEVICE

摘要

A film formation method is one for forming an organic layer comprising a fluorine-containing resin on an inorganic layer (3) formed on a substrate of interest and comprising an inorganic substance. In the method, for the formation of the inorganic layer, a reactive sputtering procedure using water vapor as a reactive gas is carried out to form the inorganic layer on the substrate of interest. Subsequently, the organic layer is formed on the inorganic layer. A film formation device enables the implementation of the film formation method.