APPARATUS AND METHODS FOR SYMMETRICAL GAS DISTRIBUTION WITH HIGH PURGE EFFICIENCY
摘要
<p>Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages extending from the flow channel to the processing region of a processing chamber.</p>
申请公布号
WO2014100413(A1)
申请公布日期
2014.06.26
申请号
WO2013US76560
申请日期
2013.12.19
申请人
APPLIED MATERIALS, INC.;KAO, CHIEN-TEH;CHANG, MEI;LAM, HYMAN;HUSTON, JOEL M.;YUAN, XIAOXIONG;CUVALCI, OLKAN
发明人
KAO, CHIEN-TEH;CHANG, MEI;LAM, HYMAN;HUSTON, JOEL M.;YUAN, XIAOXIONG;CUVALCI, OLKAN