发明名称 HOLLOW ORGANIC SILICA STRUCTURE AND METHOD FOR PRODUCING SAME
摘要 <p>Provided are a hollow organic silica structure having higher dispersibility that allows easy control of particle size and a method for the production thereof. A method for producing a hollow organic silica structure characterized in being provided with a first step for mixing an organic silane compound represented by general formula (1): R2-Si(OR1)3 (1) or general formula (2): (R1O)3Si-R3-Si(R1O)3 (2) with a solution containing silica particles, a second step for hydrolyzing the organic silane compound, a third step for aggregating the organic silane compound hydrolyzed in the second step on the surface of the silica particles with the silica particles as nuclei, and a fourth step for dissolving the silica particles that are the nuclei using a basic compound.</p>
申请公布号 WO2014098107(A1) 申请公布日期 2014.06.26
申请号 WO2013JP83838 申请日期 2013.12.18
申请人 THE UNIVERSITY OF TOKYO;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 OKUBO TATSUYA;SHIMOJIMA ATSUSHI;KOIKE NATSUME;MURAKAMI NATSUMI
分类号 C08J3/12;C08G77/50 主分类号 C08J3/12
代理机构 代理人
主权项
地址