发明名称 |
HOLLOW ORGANIC SILICA STRUCTURE AND METHOD FOR PRODUCING SAME |
摘要 |
<p>Provided are a hollow organic silica structure having higher dispersibility that allows easy control of particle size and a method for the production thereof. A method for producing a hollow organic silica structure characterized in being provided with a first step for mixing an organic silane compound represented by general formula (1): R2-Si(OR1)3 (1) or general formula (2): (R1O)3Si-R3-Si(R1O)3 (2) with a solution containing silica particles, a second step for hydrolyzing the organic silane compound, a third step for aggregating the organic silane compound hydrolyzed in the second step on the surface of the silica particles with the silica particles as nuclei, and a fourth step for dissolving the silica particles that are the nuclei using a basic compound.</p> |
申请公布号 |
WO2014098107(A1) |
申请公布日期 |
2014.06.26 |
申请号 |
WO2013JP83838 |
申请日期 |
2013.12.18 |
申请人 |
THE UNIVERSITY OF TOKYO;NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
OKUBO TATSUYA;SHIMOJIMA ATSUSHI;KOIKE NATSUME;MURAKAMI NATSUMI |
分类号 |
C08J3/12;C08G77/50 |
主分类号 |
C08J3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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