发明名称 RESIST COMPOSITION FOR IMPRINTING
摘要 <p>The purpose of the present invention is to provide a resist composition for imprinting, which is not susceptible to foaming and is suppressed in decrease in the surface tension of a resist material, while maintaining high mold releasability and having low impact on the environment. The present invention is a resist composition for imprinting, which contains (A) a curable resin or a curable monomer, (B) a crosslinking catalyst and (C) an additive type mold release agent.</p>
申请公布号 WO2014097761(A1) 申请公布日期 2014.06.26
申请号 WO2013JP79995 申请日期 2013.11.06
申请人 DAIKIN INDUSTRIES, LTD. 发明人 YAMASHITA TSUNEO;HONDA YOSHITAKA;MORITA MASAMICHI
分类号 H01L21/027;B29C59/02;B29K27/12;B29K71/00;C09K3/00 主分类号 H01L21/027
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