发明名称 POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad which hardly causes a scratch on a surface of a polishing object.SOLUTION: A polishing pad comprises a polishing layer comprising a polishing region and a light transmission region. The light transmission region comprises; a surface layer located on a surface side of the pad; and at least one soft layer laminated under the surface layer. The soft layer has lower degree of hardness than that of the surface layer.
申请公布号 JP2014113644(A) 申请公布日期 2014.06.26
申请号 JP20120267361 申请日期 2012.12.06
申请人 TOYO TIRE & RUBBER CO LTD 发明人 NAKAMURA KENJI
分类号 B24B37/22;H01L21/304 主分类号 B24B37/22
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