| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method which improve throughput.SOLUTION: A processing block 12 is disposed between an indexer block 11 and a processing block 13. One substrate W is transferred to a main transfer mechanism 128 of the processing block 12 by a main transfer mechanism 115 of the indexer block 11 and is transferred to a first processing part 121 and a heat treatment part 123 by the main transfer mechanism 128. Then, treatment is performed to the substrate W. The substrate W that has been exposed to the treatment is transferred to the main transfer mechanism 115 by the main transfer mechanism 128. Another substrate W is transferred to sub transfer mechanisms 117, 118 of a sub transfer chamber 110 by the main transfer mechanism 115 and is transferred to a main transfer mechanism 138 of the processing block 13 by the sub transfer mechanisms 117, 118. The substrate W is transferred to the sub transfer mechanisms 117, 118 by the main transfer mechanism 138 and is transferred to the main transfer mechanism 115 by the sub transfer mechanisms 117, 118. |
