STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION

摘要

A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.

主权项

1. A single source supply for a dopant gas mixture comprising:
one or more carbon-containing dopant source gases pre-mixed at a predetermined concentration with a diluent gas mixture, said one or more carbon-containing sources comprising at least CO, and said diluent gas mixture comprising an inert gas and a hydrogen-containing gas; and a sub-atmospheric delivery and storage device for maintaining the dopant gas mixture in a pressurized state within an interior volume of the device, said delivery device in fluid communication with a discharge flow path, wherein said delivery device is actuated to allow a controlled flow of the dopant composition from the interior volume of the device in response to a sub-atmospheric condition achieved along the discharge flow path.