| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin used for a negative resist composition that enables production of a resist pattern with an excellent focus margin (DOF) and CD uniformity (CDU).SOLUTION: A resin substantially consists of only a structural unit (a), a structural unit (b) and a structural unit (c), wherein the structural unit (a) is a structural unit including an acid-labile group, the structural unit (b) is a structural unit represented by formula (a3-4), and the structural unit (c) is a structural unit including a lactone ring and different from the structural unit (b). |
