| 摘要 |
<p>PROBLEM TO BE SOLVED: To stably supply a raw material gas with high purity and desired concentration to a process chamber while performing flow rate control with high precision by making substantially any raw material gas into a raw material gas with desired high temperature and high vapor pressure without causing any thermal decomposition irrelevantly to whether the raw material is solid or liquid.SOLUTION: In a raw material gas supply device comprising a raw material receiving tank, a vaporizer which vaporizes a liquid pressure-fed from the liquid receiving tank, a flow rate control device which controls the flow rate of a raw material gas from the vaporizer, and a heating device which heats desired parts of the vaporizer, high-temperature and pressure type flow rate control device, and a pipeline connected thereto, respective liquid contact parts or gas contact parts of metal surfaces of any of at least the raw material receiving tank, vaporizer, flow rate control device, pipeline connecting the devices to one another, and an on/off valve interposed in the pipeline are subjected to AlOpassive-state processing, CrOpassive state processing, or FeFpassive state processing.</p> |
