发明名称 PRE-PATTERNED FILM-BASED RESIST
摘要 Roll-to-roll processes for manufacturing touch sensors using a sheet of patterned photoresist film are disclosed. The photoresist film can include a sheet of photoresist material, such as DFR, that has been patterned by removing portions of the photoresist film using a die or laser cutting technique. In some examples, the photoresist film can be patterned such that the patterned photoresist film can be laminated to a base film and used as an etching mask or a photoresist layer in a roll-to-roll manufacturing process. In this way, the patterned photoresist film can be used in place of conventional photoresist films in roll-to-roll processes, thereby obviating the need for subsequent exposure and development operations that would otherwise be performed when using conventional photoresist films. As a result, the chance that a defect is introduced into the touch sensors is reduced by reducing the number of operations performed in the roll-to-roll process.
申请公布号 US2014175049(A1) 申请公布日期 2014.06.26
申请号 US201213724948 申请日期 2012.12.21
申请人 APPLE INC. 发明人 MOHAPATRA Siddharth;KANG Sunggu;ZHONG John Z.
分类号 H01H11/00 主分类号 H01H11/00
代理机构 代理人
主权项 1. A method comprising: forming a plurality of touch sensors on a sheet of base film; and laminating a patterned sheet of photoresist film on the sheet of base film, wherein portions of the patterned sheet of photoresist film have been removed at locations corresponding to one or more circuit elements of the plurality of touch sensors.
地址 Cupertino CA US