Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency

摘要

Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages extending from the flow channel to the processing region of a processing chamber.

主权项

1. A gas distribution assembly comprising:
a showerhead comprising a body with a first surface and a second surface, the showerhead divided into a plurality of sections; each of the plurality of sections comprising a flow channel extending through the body of the showerhead, the flow channel including an inlet end and an outlet end, the inlet end in fluid communication with an inlet and the outlet end in fluid communication with an outlet; and a plurality of passages extending from the flow channel through the body to the first surface to form an aperture on the first surface so that a gas in the flow channel can flow through the passages and out of the apertures on the first surface.