发明名称 HETEROJUNCTION BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To simultaneously achieve a high current gain, fast operation and a high voltage resistance property in an InP-based HBT.SOLUTION: A heterojunction bipolar transistor comprises: a first protection layer 111 formed from silicon nitride by covering a side surface of an emitter contact layer 108 and a top face of an emitter layer 107 outside of a region where the emitter contact layer 108 is formed; a second protection layer 113 formed from benzocyclobutene (BCB) by covering an outer side surface of the first protection layer 111, a top face of a base layer 106 excluding a region where the emitter layer 107 is formed and a region where a base electrode 110 is formed; and, in addition, a third protection layer 114 formed from silicon nitride by covering an outer side surface of the second protection layer 113, side surfaces of a first collector layer 103, a second collector layer 104, a third collector layer 105 and the base layer 106 and a bottom face of eaves of the second collector layer 104 closer to a substrate 101.
申请公布号 JP2014116381(A) 申请公布日期 2014.06.26
申请号 JP20120267874 申请日期 2012.12.07
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 KAYAO NORIHIDE;KURISHIMA KENJI;IDA MINORU
分类号 H01L21/331;H01L29/737 主分类号 H01L21/331
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