发明名称 Electrochemical Device Including Amorphous Metal Oxide
摘要 In one or more embodiments, an electrochemical device includes a substrate having a substrate surface; an amorphous metal oxide layer supported on the substrate surface; and a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer. The amorphous metal oxide layer may contact only 25 to 75 percent of the substrate surface. The amorphous metal oxide layer may include less than 10 weight percent of crystalline metal oxide. In certain instances, the amorphous metal oxide layer is substantially free of crystalline metal oxide.
申请公布号 US2014178801(A1) 申请公布日期 2014.06.26
申请号 US201213721908 申请日期 2012.12.20
申请人 FORD GLOBAL TECHNOLOGIES LLC 发明人 Yang Jun;Pietrasz Patrick;Xu Chunchuan;Soltis Richard E.;Sulek Mark S.;Novak Robert F.
分类号 H01M4/88 主分类号 H01M4/88
代理机构 代理人
主权项 1. An electrochemical device comprising: a substrate having a substrate surface; an amorphous metal oxide layer supported on the substrate surface; and a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer.
地址 US