APPARATUS FOR CONTROLLING LASER BEAM, AND APPARATUS FOR GENERATING EXTREME UV LIGHT

摘要

This apparatus for controlling a laser beam may be provided with: a guide laser device; a guide laser beam wavefront adjuster disposed in the light path of the guide laser beam outputted from the guide laser device; a beam combiner configured so as to establish a mutual essential correspondence between the direction of travel of a laser beam outputted from a laser system and the direction of travel of the guide laser beam outputted from the guide laser beam wavefront adjuster; a twin-beam wavefront adjuster disposed in the light path of both the laser beam and the guide laser beam outputted from the beam combiner; a beam monitor disposed on the light path of both the laser beam and the guide laser beam outputted from the twin-beam wavefront adjuster; and a controller configured to control the guide laser beam wavefront adjuster and the twin-beam wavefront adjuster on the basis of the result of detection by the beam monitor both for the laser beam and for the guide laser beam.