RESIST COMPOSITION AND RESIST PATTERN PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist composition that enables production of a negative resist pattern with excellent line edge roughness.SOLUTION: A resist composition contains a resin that includes a (meth) acrylate structural unit including an alicyclic hydrocarbon group in a side chain and a (meth) acrylate structural unit including a fluorine atom containing saturated hydrocarbon group in a side chain and does not include an acid-labile group, a resin that includes a structural unit represented by formula (II) and includes a structural unit including an acid-labile group, and an acid generator.