| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables production of a resist pattern with excellent pattern collapse resistance.SOLUTION: A resist composition contains a resin that includes a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not include an acid-labile group, a resin including an acid-labile group, and an acid generator represented by formula (II). In the formula (I), Ris a 3-18C alicyclic hydrocarbon group, where a hydrogen atom bonding to a carbon atom at a bonding position to Lis not substituted with a 1-8C aliphatic hydrocarbon group. |
