SUB-WAVELENGTH EXTREME ULTRAVIOLET METAL TRANSMISSION GRATING AND MANUFACTURING METHOD THEREOF

摘要

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.

主权项

1. A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating, comprising:
forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished; spin-coating a silicon nitride film on a front surface of the silicon-based substrate with an electron beam resist (HSQ); performing electron beam direct writing exposure on the HSQ, and then performing developing and fixing to form a plurality of grating line patterns having a duty cycle of 1:3 and a ring pattern surrounding the grating line patterns; depositing a chrome material on the front surface of the silicon-based substrate through magnetron sputtering as a light-blocking layer for the grating line patterns and the ring pattern; removing the chrome material inside the ring pattern so that only the chrome material outside the ring pattern is retained as a absorber of scattering light; growing a gold material on the front surface of the silicon-based substrate through atomic layer deposition; and removing the gold material on the chrome material outside the ring pattern, between the grating line patterns, and on the grating line patterns so that only the gold material on sidewalls of the grating line patterns is retained.