| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables production of a resist pattern with excellent line edge roughness (LER).SOLUTION: A resist composition contains a resin that includes a structural unit represented by formula (I) and a (meth) acrylic acid ester structure unit including a 1-20C perfluoroalkyl group and does not include an acid-labile group, a resin that includes a specific structural unit including a sultone ring and a structural unit including an acid-labile group, and an acid generator. In the formula (I), Ris a hydrogen atom or a methyl group, Ris a 3-18C alicyclic hydrocarbon group, and a hydrogen atom included in the alicyclic hydrocarbon group may be substituted with a 1-8C aliphatic hydrocarbon group or a hydroxy group, where a hydrogen atom bonding to a carbon atom at a bonding position to Lis not substituted with a 1-8C aliphatic hydrocarbon group. |
