发明名称 |
COATING LIQUID FOR FORMING DIFFUSION PREVENTION LAYER, PROCESS OF MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH DOPANT DELUSION LAYER USING THE SAME, AND PROCESS OF MANUFACTURING SOLAR CELL |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a coating liquid for forming a diffusion prevention layer, process of manufacturing a semiconductor substrate with a dopant diffusion layer using the same, and process of manufacturing a solar cell, having high uniformity in diffusion prevention performance and excellent in film formation performance by screen printing and such.SOLUTION: The coating liquid for forming a diffusion prevention layer for preventing dopant diffusion by coating on a surface of a semiconductor substrate contains components (A) and (B) described below. (A) a polyvinyl alcohol resin. (B) a metal oxide fine particle.</p> |
申请公布号 |
JP2014116572(A) |
申请公布日期 |
2014.06.26 |
申请号 |
JP20130011578 |
申请日期 |
2013.01.25 |
申请人 |
NIPPON SYNTHETIC CHEM IND CO LTD:THE |
发明人 |
KATSUMA KATSUHIKO;SATO HIROAKI;KATO KUNIYASU;TSUTSUMI YUKA |
分类号 |
H01L21/22;H01L21/225;H01L31/06 |
主分类号 |
H01L21/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|