发明名称 COATING LIQUID FOR FORMING DIFFUSION PREVENTION LAYER, PROCESS OF MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH DOPANT DELUSION LAYER USING THE SAME, AND PROCESS OF MANUFACTURING SOLAR CELL
摘要 <p>PROBLEM TO BE SOLVED: To provide a coating liquid for forming a diffusion prevention layer, process of manufacturing a semiconductor substrate with a dopant diffusion layer using the same, and process of manufacturing a solar cell, having high uniformity in diffusion prevention performance and excellent in film formation performance by screen printing and such.SOLUTION: The coating liquid for forming a diffusion prevention layer for preventing dopant diffusion by coating on a surface of a semiconductor substrate contains components (A) and (B) described below. (A) a polyvinyl alcohol resin. (B) a metal oxide fine particle.</p>
申请公布号 JP2014116572(A) 申请公布日期 2014.06.26
申请号 JP20130011578 申请日期 2013.01.25
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 KATSUMA KATSUHIKO;SATO HIROAKI;KATO KUNIYASU;TSUTSUMI YUKA
分类号 H01L21/22;H01L21/225;H01L31/06 主分类号 H01L21/22
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