| 发明名称 |
CHEMICAL VAPOR DEPOSITION OF FLUOROCARBON POLYMERS |
| 摘要 |
Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed. The structure surface is maintained at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface. |
| 申请公布号 |
US2014178584(A1) |
申请公布日期 |
2014.06.26 |
| 申请号 |
US201213723449 |
申请日期 |
2012.12.21 |
| 申请人 |
Zhuk Andrew Vladimirovich;Sonnenberg Neville |
发明人 |
Zhuk Andrew Vladimirovich;Sonnenberg Neville |
| 分类号 |
B05D1/00 |
主分类号 |
B05D1/00 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A method for forming a fluorocarbon polymer on a surface of a structure, comprising the steps of:
directing a feedstock gas through a porous heat member having a temperature sufficient to crack the feedstock gas to produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals and that selectively promotes (CF2)n polymerization, the reactive species being in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed; and maintaining the structure surface at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface. |
| 地址 |
Boston MA US |
