| 摘要 |
The present invention relates to an elevator type wafer cleaner capable of preventing contamination between unnecessary wafer moves in a duplex wafer process. The present invention provides the elevator type wafer cleaner which comprises: a loading bath in which a wafer is loaded; an unloading bath, separated from the loading bath, in which a wafer is unloaded; a plurality of cleaning bath arranged in a slope between the loading bath and the unloading bath; a slope rail arranged with an inclination in the upper side of the cleaning bath; and a tilt robot which transfers the wafer to the cleaning bath by moving along the slope rail. |
