发明名称 |
PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION |
摘要 |
The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures. |
申请公布号 |
US2014178807(A1) |
申请公布日期 |
2014.06.26 |
申请号 |
US201414194009 |
申请日期 |
2014.02.28 |
申请人 |
Wisconsin Alumni Research Foundation |
发明人 |
Gopalan Padma;Han Eungnak |
分类号 |
G03F7/09 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
1. A structure comprising:
a crosslinked polymer mat, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer mat has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 2%; and a self-assembled block copolymer film disposed over the crosslinked polymer mat, the self-assembled block copolymer film comprising domains oriented perpendicular to the crosslinked polymer mat. |
地址 |
Madison WI US |