发明名称 PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION
摘要 The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
申请公布号 US2014178807(A1) 申请公布日期 2014.06.26
申请号 US201414194009 申请日期 2014.02.28
申请人 Wisconsin Alumni Research Foundation 发明人 Gopalan Padma;Han Eungnak
分类号 G03F7/09 主分类号 G03F7/09
代理机构 代理人
主权项 1. A structure comprising: a crosslinked polymer mat, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer mat has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 2%; and a self-assembled block copolymer film disposed over the crosslinked polymer mat, the self-assembled block copolymer film comprising domains oriented perpendicular to the crosslinked polymer mat.
地址 Madison WI US