| 摘要 |
<p>The present invention relates to a method for manufacturing a substrate having a plurality of levels which comprises the steps of: attaching a solid photosensitive material on a substrate; positioning a first film mask on the solid photosensitive material to light expose; exposing a part of the substrate by developing the solid photosensitive material; primary etching the part of the substrate by spraying an etching solution to the exposed portion of the substrate; removing the solid photosensitive material; electrodeposit-coating the substrate formed in the primary etching step; exposing a part of the substrate by patterning the electrodeposit-coated substrate with a laser; secondary etching a part of the substrate primarily etched by spraying the etching solution to the exposed part of the substrate; and removing the electrodeposit coating.</p> |
