| 发明名称 |
E-BEAM PLASMA SOURCE WITH PROFILED E-BEAM EXTRACTION GRID FOR UNIFORM PLASMA GENERATION |
| 摘要 |
A plasma, reactor that relies on an electron beam as a plasma source employs a profiled electron beam extraction grid in an electron beam source to improve uniformity. |
| 申请公布号 |
KR20140078748(A) |
申请公布日期 |
2014.06.25 |
| 申请号 |
KR20147013087 |
申请日期 |
2012.10.12 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DORF LEONID;RAUF SHAHID;COLLINS KENNETH S.;MISRA NIPUN;CARDUCCI JAMES D.;LERAY GARY;RAMASWAMY KARTIK |
| 分类号 |
H05H1/24;H01L21/205 |
主分类号 |
H05H1/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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