| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflection type mask and a method of manufacturing the same which can maintain transfer characteristics even if contamination cleaning is carried out, and can suitably correct a white defect. <P>SOLUTION: The reflection type mask includes a substrate, a multilayered film formed on the substrate, and an absorbing layer formed on the multilayered film in a pattern. The reflection type mask includes a pattern which has an absorbing region where the absorbing layer is formed on the multilayered film, a reflection region where the absorbing layer is not formed on the multilayered film, and a white defect correction region where the multilayered film positioned in a white defect part caused by the lack of the absorbing layer is removed, and in which the absorbing region and the white defect correction region are adjacent. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
