CHEMICAL VAPOR DEPOSITION APPARATUS AND CHEMICAL VAPOR DEPOSITION METHOD USING THE SAME

摘要

The present invention relates to a chemical vapor deposition device for accurate and precise deposition and a chemical vapor deposition method using the same. The chemical vapor deposition device according to the present invention comprises a reaction chamber; a heating part for heating the reaction chamber; a preliminary chamber coupled to one end of the reaction chamber; and a transfer part arranged in the preliminary chamber and transferring precursors to the reaction chamber.