发明名称 GaN HEMTs and GaN diodes
摘要 <p>A GaN heterojunction structure has a three-layer dielectric structure. The lowermost and middle portions of the gate electrode together define the gate foot, and this is associated with two dielectric layers. A thinner first dielectric layer is adjacent the gate edge at the bottom of the gate electrode. The second dielectric layer corresponds to the layer in the conventional structure, and it is level with the main portion of the gate foot.</p>
申请公布号 EP2747143(A1) 申请公布日期 2014.06.25
申请号 EP20120198130 申请日期 2012.12.19
申请人 NXP B.V. 发明人 HURKX, GODEFRIDUS;CROON, JEROEN;DONKERS, JOHANNES;HEIL, STEPHAN;SONSKY, JAN
分类号 H01L29/778;H01L23/29;H01L23/31;H01L29/20;H01L29/423 主分类号 H01L29/778
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