| 摘要 |
A gas distribution system of a reaction chamber wherein the reaction chamber has a body defining a closed inner volume, in the inner volume rectangular substrates are arranged spaced apart from each other and electrodes suitable for providing high-frequency electromagnetic field are disposed between the substrates; the spaces between the substrates provide flow channels for the laminar flow of reaction gases between two opposite sides of the chamber, and the gas distribution system comprises an inlet channel, a gas distribution area and a distributing plate on one side of the chamber, and a collecting plate, a collection area and an outlet channel on the other side, and in the gas distribution system between the inlet channel and the distribution area a mixing chamber is provided, which is separated from the distribution area by a wall portion and provides better mixing and homogenization of reaction gases. |
