发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a light shielding unit capable of adjusting light intensity distribution in an angle direction at every position on a surface to be irradiated, to provide an illumination optical system and an exposure apparatus, and to provide a device manufacturing method. <P>SOLUTION: The light shielding unit 47 which is arranged in the illumination optical system 13 illuminating exposure light EL emitted from a light source device 12 on the surface to be irradiated Ra through an optical integrator 28 and adjusts light intensity distribution in the angle direction of luminous flux reaching the surface to be irradiated Ra is provided with a plurality of light shielding members 55 which are arranged on a side of the surface to be irradiated Ra compared to the optical integrator 28 in an optical path of exposure light EL and are disposed in parallel along a direction crossing an optical axis direction of the illumination optical system 13 and with a displacement structure displacing the respective light shielding members 55 to a direction crossing the optical axis direction in the optical path of exposure light EL. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP5532620(B2) 申请公布日期 2014.06.25
申请号 JP20090033002 申请日期 2009.02.16
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址