Highly dilutable polishing concentrates and slurries

摘要

The present disclosure provides a chemical mechanical polishing slurry, and a method of producing such a slurry by diluting a concentrate to a point of use slurry. The slurry is obtained by diluting a concentrate comprising abrasive, complexing agent, and corrosion inhibitor, and the concentrate with water and an oxidizer. The concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.