ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

摘要

An electrostatic chuck includes a dielectric, an electrode, a pedestal, a heater, an adhesion layer, and a protective ring. A substrate is placed on the dielectric. The electrode built in the dielectric produces plasma on the upper part of the substrate. The pedestal is arranged on the lower part of the dielectric. The heater is arranged between the pedestal and the dielectric, and heats the substrate. The adhesion layer is interposed between the pedestal and the heater, and between the heater and the dielectric. The protective ring surrounds the heater and the adhesion layer, is made from a material which prevents wear and tear caused by the plasma, and is used to prevent the adhesion layer from being exposed to the plasma, thereby increasing a service life of the electrostatic chuck and preventing the generation of particles.