| 发明名称 |
SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION |
| 摘要 |
An array of electron beam sources surrounding a processing region of a plasma reactor is periodically switched to change electron beam propagation direction and remove or reduce non-uniformities. |
| 申请公布号 |
KR20140078747(A) |
申请公布日期 |
2014.06.25 |
| 申请号 |
KR20147013085 |
申请日期 |
2012.10.15 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DORF LEONID;RAUF SHAHID;COLLINS KENNETH S.;MISRA NIPUN;CARDUCCI JAMES D.;LERAY GARY;RAMASWAMY KARTIK |
| 分类号 |
H05H1/46;H01L21/3065 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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