发明名称 Semiconductor device having stacked body on substrate via joining metal and method for manufacturing the same
摘要 According to one embodiment, a semiconductor device includes a substrate and a stacked body on the substrate via a joining metal layer. The stacked body includes a device portion and a peripheral portion. The device portion includes from a bottommost layer to a topmost layer included in the stacked body. The peripheral portion surrounding and provided around the device portion; the peripheral portion is a portion of the bottommost layer to the topmost layer included in the stacked body and includes a portion of a semiconductor layer in contact with the joining metal layer.
申请公布号 US8759852(B2) 申请公布日期 2014.06.24
申请号 US201113039583 申请日期 2011.03.03
申请人 Kabushiki Kaisha Toshiba 发明人 Fujiwara Akihiro;Hakuno Takashi;Matsunaga Tokuhiko;Yoshimura Kimitaka;Kondo Katsufumi
分类号 H01L29/22;H01L29/24 主分类号 H01L29/22
代理机构 White & Case LLP 代理人 White & Case LLP
主权项 1. A semiconductor device comprising: a substrate; and a stacked body on the substrate via a joining metal layer comprising: a device portion including from a bottommost layer to a topmost layer included in the stacked body, anda peripheral portion surrounding and provided around the device portion, the peripheral portion being a portion of the bottommost layer to the topmost layer included in the stacked body and including a portion of a semiconductor layer in contact with the joining metal layer,the semiconductor layer being one selected from Inx(GayAl1−y)1−xP (0≦x≦1 and 0≦y≦1), BxInyGazAl1−x−y−zN (0≦x≦1, 0≦y≦1, 0≦z≦1, and x+y+z≦l) and GaAlAs.
地址 Tokyo JP