发明名称 | Semiconductor device having stacked body on substrate via joining metal and method for manufacturing the same | ||
摘要 | According to one embodiment, a semiconductor device includes a substrate and a stacked body on the substrate via a joining metal layer. The stacked body includes a device portion and a peripheral portion. The device portion includes from a bottommost layer to a topmost layer included in the stacked body. The peripheral portion surrounding and provided around the device portion; the peripheral portion is a portion of the bottommost layer to the topmost layer included in the stacked body and includes a portion of a semiconductor layer in contact with the joining metal layer. | ||
申请公布号 | US8759852(B2) | 申请公布日期 | 2014.06.24 |
申请号 | US201113039583 | 申请日期 | 2011.03.03 |
申请人 | Kabushiki Kaisha Toshiba | 发明人 | Fujiwara Akihiro;Hakuno Takashi;Matsunaga Tokuhiko;Yoshimura Kimitaka;Kondo Katsufumi |
分类号 | H01L29/22;H01L29/24 | 主分类号 | H01L29/22 |
代理机构 | White & Case LLP | 代理人 | White & Case LLP |
主权项 | 1. A semiconductor device comprising: a substrate; and a stacked body on the substrate via a joining metal layer comprising: a device portion including from a bottommost layer to a topmost layer included in the stacked body, anda peripheral portion surrounding and provided around the device portion, the peripheral portion being a portion of the bottommost layer to the topmost layer included in the stacked body and including a portion of a semiconductor layer in contact with the joining metal layer,the semiconductor layer being one selected from Inx(GayAl1−y)1−xP (0≦x≦1 and 0≦y≦1), BxInyGazAl1−x−y−zN (0≦x≦1, 0≦y≦1, 0≦z≦1, and x+y+z≦l) and GaAlAs. | ||
地址 | Tokyo JP |