Lithographic apparatus and surface cleaning method

摘要

An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

主权项

1. A lithographic apparatus comprising:
a fluid handling system configured to confine immersion liquid to a space between a final element of a projection system and a substrate and/or a table, the fluid handling system comprising at least two openings configured to supply liquid to a gap between the fluid handling system and the substrate and/or the table and to extract liquid from the gap; and a controller configured to control the direction of liquid flow through the at least two openings during an exposure operation such that the at least two openings extract liquid from the gap and to control a direction of liquid flow through the at least two openings such that during a cleaning operation other than during exposure of the substrate using the projection system, the directions of liquid flow through at least two of the at least two openings are opposite.