Antireflection film, optical element comprising antireflection film, stamper, process for producing stamper, and process for producing antireflection film

摘要

An antireflection film of the present invention includes a plurality of first raised portions, each of which has a two-dimensional size of not less than 1 μm and less than 100 μm when seen in a direction normal to the film, and a plurality of second raised portions, each of which has a two-dimensional size of not less than 10 nm and less than 500 nm when seen in a direction normal to the film. In at least one embodiment, the antireflection film has a first surface shape or a second surface shape that is inverse to the first surface shape relative to a film surface. In the first surface shape, the second raised portions are provided on the first raised portions and between the plurality of first raised portions, and the elevation angle α of a surface of the first raised portions relative to the film surface is about 90° or more. The antireflection film of the present invention has a more excellent antiglare function than conventional ones.

主权项

1. A method of fabricating a stamper including a surface shape used to form an antireflection-antiglare film with a first surface shape, the surface shape of the stamper being an inversion shape of the first surface shape, the first surface shape including a plurality of first raised portions, each of which has a two-dimensional size of not less than 1 μm and less than 100 μm when seen in a direction normal to the surface, and a plurality of second raised portions, each of which has a two-dimensional size of not less than 10 nm and less than 500 nm when seen in a direction normal to the surface, the plurality of second raised portions being provided on the plurality of first raised portions and between the plurality of first raised portions, and an elevation angle of a surface of the plurality of first raised portions relative to the film surface being about 90° or more, comprising the steps of:
(a) providing an Al base including at least one element selected from the group consisting of Mn, Mg, and Fe, in which an Al content is 99.0 mass % or less; (b) partially anodizing the Al base to form a porous alumina layer having a first plurality of recessed portions; (c) bringing the porous alumina layer into contact with an alumina etchant to enlarge the first plurality of recessed portions of the porous alumina layer so that the recessed portions of the first plurality of recessed portions correspond in size to the first raised portions, each of which has a two-dimensional size of not less than 1 μm and less than 100 μm when seen in a direction normal to the surface; and (d) performing at least one additional anodizing step and at least one additional etching step thereby forming a second plurality of recessed portions in the porous alumina layer so that the recessed portions of the second plurality of recessed portions correspond in size to the second raised portions, each of which has a two-dimensional size of not less than 10 nm and less than 500 nm when seen in a direction normal to the surface, the recessed portions corresponding in size to the second raised portions being formed in and between the recessed portions corresponding in size to the first raised portions.