| 摘要 |
<p>The present invention relates to an optical system of a micro lithographic projection exposure apparatus, which comprises a mirror arrangement (200) which has mirror elements (200a, 200b, 200c, ...) which can be independently adjusted to change the angle distribution of a beam reflected by the mirror arrangement (200), a polarization-effect optical arrangement (100, 400) which has at least one polarization-effect element (101, 102, 103, 401, 402, 403) - the overlapping level between the polarization-effect element (101, 102, 103, 401, 402, 403) and the mirror arrangement (200) can be variably set by displacing the polarization-effect element -, and a deflector (300, 360, 370) which each has a reflection surface (300a, 300b, 360a, 360b, 370a, 370b) in the upper class and the lower class of the mirror arrangement (200) with regard to a beam propagation direction.</p> |
