Power supply control device, plasma processing device, and plasma processing method

摘要

According to one embodiment, a power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber. The power supply control device includes a radio frequency power supply, a storage unit, and a matching circuit. The radio frequency power supply supplies a power to the plasma generation unit. The storage unit stores matching information including a first matching value, a second process condition, and a third matching value. The first matching value corresponds to process information of a first process condition. The second matching value corresponds to process information of a second process condition. The third matching value corresponds to process information of a transient state where the first process condition is being switched to the second process condition. The matching circuit matches impedances based on the matching information.

主权项

1. A power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber, the power supply control device comprising:
a radio frequency power supply which supplies a power to the plasma generation unit; a storage unit which stores matching information including a first matching value, a second matching value, and a third matching value, the first matching value corresponding to process information of a first process condition, the second matching value corresponding to process information of a second process condition, and the third matching value corresponding to process information of a transient state where the first process condition is being switched to the second process condition; and a matching circuit which matches impedances based on the matching information.