发明名称 Electroplating apparatus
摘要 A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source is provided. The system includes a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode, a plating tank configured to receive the cylinder, a controller configured to control operation of the apparatus, and a tube for delivering a mixture of a hardener and the plating solution to the plating tank.
申请公布号 US8758577(B2) 申请公布日期 2014.06.24
申请号 US201213651209 申请日期 2012.10.12
申请人 Chema Technology, Inc. 发明人 Metzger Hubert F.
分类号 C25D1/04;C25D5/04;C25D5/48;C25D7/04;C25D17/02;C25D21/14;C25D5/20;C25D21/18;C25D7/00;C25D17/06;C25D17/00;B41C1/18 主分类号 C25D1/04
代理机构 Foley & Lardner LLP 代理人 Foley & Lardner LLP
主权项 1. A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source, the system comprising: a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode; a plating tank configured to receive the cylinder; a controller configured to control operation of the apparatus; and a tube for delivering a mixture of a hardener and the plating solution to the plating tank, the tube having a first end and a second end, the first end coupled to a spray bar disposed in the plating tank and configured to provide the mixture on or near the cylinder; and an acidic rinse connection system configured to deoxidize the cylinder after plating and having a first end coupled to the second end of the tube, the acidic rinse connection system having a dosing pump configured to provide acid to the tube to create a mixture of the acid and the plating solution comprising between 0.5 and 5 percent by weight of sulfuric acid.
地址 Waukesha WI US