发明名称 |
Electroplating apparatus |
摘要 |
A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source is provided. The system includes a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode, a plating tank configured to receive the cylinder, a controller configured to control operation of the apparatus, and a tube for delivering a mixture of a hardener and the plating solution to the plating tank. |
申请公布号 |
US8758577(B2) |
申请公布日期 |
2014.06.24 |
申请号 |
US201213651209 |
申请日期 |
2012.10.12 |
申请人 |
Chema Technology, Inc. |
发明人 |
Metzger Hubert F. |
分类号 |
C25D1/04;C25D5/04;C25D5/48;C25D7/04;C25D17/02;C25D21/14;C25D5/20;C25D21/18;C25D7/00;C25D17/06;C25D17/00;B41C1/18 |
主分类号 |
C25D1/04 |
代理机构 |
Foley & Lardner LLP |
代理人 |
Foley & Lardner LLP |
主权项 |
1. A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source, the system comprising:
a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode; a plating tank configured to receive the cylinder; a controller configured to control operation of the apparatus; and a tube for delivering a mixture of a hardener and the plating solution to the plating tank, the tube having a first end and a second end, the first end coupled to a spray bar disposed in the plating tank and configured to provide the mixture on or near the cylinder; and an acidic rinse connection system configured to deoxidize the cylinder after plating and having a first end coupled to the second end of the tube, the acidic rinse connection system having a dosing pump configured to provide acid to the tube to create a mixture of the acid and the plating solution comprising between 0.5 and 5 percent by weight of sulfuric acid.
|
地址 |
Waukesha WI US |