发明名称 Super trench schottky barrier schottky diode
摘要 A Schottky diode includes an n+-substrate, an n-epilayer, trenches introduced into the n-epilayer, floating Schottky contacts being located on their side walls and on the entire trench bottom, mesa regions between the adjacent trenches, a metal layer on its back face, this metal layer being used as a cathode electrode, and an anode electrode on the front face of the Schottky diode having two metal layers, the first metal layer of which forms a Schottky contact and the second metal layer of which is situated below the first metal layer and also forms a Schottky contact. Preferably, these two Schottky contacts have different barrier heights.
申请公布号 US8759888(B2) 申请公布日期 2014.06.24
申请号 US201213691038 申请日期 2012.11.30
申请人 Robert Bosch GmbH 发明人 Qu Ning;Goerlach Alfred
分类号 H01L29/80;H01L31/112 主分类号 H01L29/80
代理机构 Kenyon & Kenyon LLP 代理人 Kenyon & Kenyon LLP
主权项 1. A Schottky diode, comprising: an n+-substrate; an n-epilayer; trenches introduced into the n-epilayer; mesa regions between adjacent trenches; a metal layer on a back face of the diode, the metal layer being used as a cathode electrode; an anode electrode provided on a front face of the diode, the anode electrode having two metal layers, a first metal layer forming a Schottky contact, and a second metal layer being situated below the first metal layer and also forming a Schottky contact; and additional, floating Schottky contacts situated on walls of the trenches between the second metal layer and bottoms of the trenches.
地址 Stuttgart DE