发明名称 Method of manufacturing a ladder filter
摘要 A method of manufacturing a ladder filter including first and second resonators includes: forming a piezoelectric film on an entire surface of a substrate that has respective lower electrodes of the first and second resonator formed thereon, an conductive film on the piezoelectric film, and a second film on the conductive film; forming a pattern of the second film in a prescribed region in the second area; forming a first film on an entire surface of the substrate; etching the first film, forming a pattern of the first film, the second film and the conductive film in the second area, and forming a pattern of the first film and the conductive film in the first area, to form respective upper electrodes from the conductor film; and thereafter, etching the piezoelectric film to form respective patterns of the piezoelectric film in the first and second areas, respectively.
申请公布号 US8756777(B2) 申请公布日期 2014.06.24
申请号 US200912647794 申请日期 2009.12.28
申请人 Taiyo Yuden Co., Ltd. 发明人 Taniguchi Shinji;Nishihara Tokihiro;Yokoyama Tsuyoshi;Iwaki Masafumi;Endo Go;Saitou Yasuyuki;Ehara Hisanori;Ueda Masanori
分类号 H04R17/00;H03H9/205;H03H9/56;H03H9/64;H03H9/15;H03H9/17;H03H9/54;H03H9/60;H03H3/00;H03H3/007 主分类号 H04R17/00
代理机构 Chen Yoshimura LLP 代理人 Chen Yoshimura LLP
主权项 1. A method of manufacturing a ladder filter including first and second resonators, the method comprising: forming respective lower electrodes for the first and second resonators over a substrate in first and second areas of the substrate, respectively; forming a piezoelectric film on an entire surface of the substrate having the lower electrodes formed thereon; forming an conductive film on an entire surface of the piezoelectric film; forming a second film on an entire surface of the conductive film including the first and second areas; thereafter, forming a pattern of the second film on the conductive film having a prescribed shape that overlaps with the lower electrode for the second resonator in the second area by etching out the second film to expose a surface of the conductive film in the first and second areas other than the pattern of the second film in the second area; thereafter, forming a first film on an entirety of the exposed surface of the conductive film in the first and second areas and on the pattern of the second film in the second area; thereafter, etching the first film, the second film, and the conductive film to form a pattern of the first film, the second film and the conductive film on the piezoelectric film in the second area, and to form a pattern of the first film and the conductive film on the piezoelectric film in the first area, the conductive film thereby patterned in the second area being an upper electrode for the second resonator and overlapping with the lower electrode for the second resonator, the conductive film thereby patterned in the first area being an upper electrode for the first resonator and overlapping with the lower electrode for the first resonator; and thereafter, etching the piezoelectric film to form respective patterns of the piezoelectric film in the first and second areas, respectively, thereby forming the first resonator in the first area and the second resonator in the second area.
地址 Tokyo JP