| 摘要 |
A radiation-sensitive resin composition is provided to form a sufficient spacer shape with high sensitivity even by an exposure amount of 1,000 J/m^2 or less, and to be superior in elastic recovery, rubbing resistance, and adhesiveness with a transparent substrate. A radiation-sensitive resin composition includes [A1] a polymer obtained by reacting a copolymer of (a1) at least one selected from the group comprising unsaturated carboxylic acids and unsaturated carboxylic anhydrides and (a2) an unsaturated compound containing at least one hydroxyl group in a molecule, with an isocyanate group-containing unsaturated compound represented by the following formula 1, and [A2] a copolymer of (a1) at least one selected from the group comprising unsaturated carboxylic acids and unsaturated carboxylic anhydrides and (a2) an unsaturated compound having an oxylanyl group or oxetanyl group. In the formula 1, R^1 is a hydrogen atom or methyl group, and n is an integer of 1-12. |
