Filter, exposure apparatus, and method of manufacturing device

摘要

A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

主权项

1. An exposure apparatus for exposing a substrate to light, the apparatus comprising:
a light source that emits light containing a first light having a first wavelength, and a second light having a second wavelength shorter than the first wavelength; and a filter that reflects the first light of the light emitted by the light source, and transmits the second light of the light emitted by the light source, wherein the filter includes a plurality of plate members having a plurality of openings, wherein the plurality of plate members are arranged one-dimensionally or two-dimensionally, wherein wall surfaces of the plurality of plate members are parallel to a direction to which the second light is transmitted, wherein an end surface, on a side on which light is incident, formed by the plurality of plate members is nonparallel to a plane perpendicular to a direction to which the second light is transmitted, and wherein the substrate is exposed to the second light transmitted through the filter.