| 发明名称 |
METHOD OF FORMING A FINE PATTERN |
| 摘要 |
<p>A method for forming a fine pattern according to the present invention includes a step of arranging a conductive layer on a magnetic mask, a step of forming a particle mask on the conducive layer by using magnetic particles, a step of forming a fine pattern by etching the conductive layer by using the particle mask as a mask, and a step of removing the particle mask.</p> |
| 申请公布号 |
KR20140077468(A) |
申请公布日期 |
2014.06.24 |
| 申请号 |
KR20120146315 |
申请日期 |
2012.12.14 |
| 申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, JONG DUK;AHN, TAE BIN |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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