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发明名称
RADIATION SOURCE DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要
申请公布号
NL2012720(A)
申请公布日期
2014.06.23
申请号
NL20142012720
申请日期
2014.04.30
申请人
ASML NETHERLANDS B.V.
发明人
JONG ARJEN;VELTMAN ROB;JILISEN REINIER
分类号
G03F7/20;H05G2/00
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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