MOLD STRUCTURE AND METHOD OF IMPRINT LITHOGRAPHY USING THE SAME

摘要

A mold structure for imprint is provided. Mold chip patterns which are protruded from a mold substrate and include a pattern for forming nanostructures are provided, and a trench region between the mold chip patterns is also provided. Protrusions which are protruded from a lower surface of the trench region and are extended along the trench region are provided.